发明名称 METHOD OF MANUFACTURING ANTIREFLECTIVE FILM AND ANTIREFLECTIVE FILM, AND ELEMENT AND DEVICE FOR SPATIAL OPTICAL MODULATION
摘要 <P>PROBLEM TO BE SOLVED: To provide a method of manufacturing the antireflective film which has high transmissivity to infrared light, an antireflective film which is obtained by the method, a spatial optical modulating element which has the antireflective film and employs the infrared light as readout light, and a spatial optical modulating device equipped with the element. <P>SOLUTION: The method of manufacturing an antireflective film (transparent electrode) 20 having an antireflective function for light to be used includes a laminated body forming process of forming, on a transparent substrate 26, a laminated body 21 including a transparent conductive layer 22 which contains metal oxide and has light transmissivity and conductivity and at least one electric layer 24 which has light transmissivity and a refractive index different from that of the transparent conductive layer and is arranged adjacently to the transparent conductive layer and a heat treatment process of heat-treating the laminated body obtained in the laminated body forming process while holding it gas containing an oxidizer at a specified heat-treatment temperature of &ge;300&deg;C. <P>COPYRIGHT: (C)2004,JPO
申请公布号 JP2003322702(A) 申请公布日期 2003.11.14
申请号 JP20020128788 申请日期 2002.04.30
申请人 HAMAMATSU PHOTONICS KK 发明人 OBAYASHI YASUSHI
分类号 G02F1/1335;G02B1/11 主分类号 G02F1/1335
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