发明名称 Conductive polishing article for electrochemical mechanical polishing
摘要 An article of manufacture, method, and apparatus are provided for planarizing a substrate surface. In one aspect, an article of manufacture is provided for polishing a substrate including a polishing article having a body comprising at least a portion of fibers coated with a conductive material, conductive fillers, or combinations thereof, and adapted to polish the substrate. In another aspect, a polishing article includes a body having a surface adapted to polish the substrate and at least one conductive element embedded in the polishing surface, the conductive element comprising dielectric or conductive fibers coated with a conductive material, conductive fillers, or combinations thereof. The conductive element may have a contact surface that extends beyond a plane defined by the polishing surface. A plurality of perforations and a plurality of grooves may be formed in the articles to facilitate flow of material through and around the polishing article.
申请公布号 US2003209448(A1) 申请公布日期 2003.11.13
申请号 US20020140010 申请日期 2002.05.07
申请人 HU YONGQI;WANG YAN;DUBOUST ALAIN;LIU FENG Q.;MAVLIEV RASHID;CHEN LIANG-YUH;MORAD RATSON;SOMEKH SASSON 发明人 HU YONGQI;WANG YAN;DUBOUST ALAIN;LIU FENG Q.;MAVLIEV RASHID;CHEN LIANG-YUH;MORAD RATSON;SOMEKH SASSON
分类号 C25D7/12;B23H5/08;B24B37/04;B24D13/14;C25F3/00;C25F3/30;C25F7/00;H01L21/304;(IPC1-7):B23H3/00 主分类号 C25D7/12
代理机构 代理人
主权项
地址