发明名称 Tungsten film coating method using tungsten oxide powders
摘要 Disclosed is a tungsten film coating method using tungsten oxide powders including the steps of contacting the tungsten oxide powders with a metal substrate and carrying out thermal reduction treatment thereon at a temperature of at least 650° C. under a hydrogen atmosphere just to coat the tungsten film on the metal substrate. Accordingly, the present invention enables to provide a simple method of coating a tungsten thin film on a metal substrate using the phenomenon of tungsten migration through vapor phase when thermal reduction treatment is carried out on tungsten oxide powders without using previous chemical or physical vapor depositions requiring expensive precision equipments or causing environmental pollution.
申请公布号 US2003211238(A1) 申请公布日期 2003.11.13
申请号 US20030340505 申请日期 2003.01.10
申请人 AGENCY FOR DEFENSE DEVELOPMENT 发明人 LEE SEONG;HONG MOON-HEE;NOH JOON-WOONG;KIM EUN-PYO;PARK YOON-SIK
分类号 C23C24/08;C23C26/00;(IPC1-7):B05D1/12;B05D3/02 主分类号 C23C24/08
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