ALIGNMENT SYSTEM, ALIGNMENT METHOD AND PRODUCTION METHOD FOR SEMICONDUCTOR DEVICE

摘要

An alignment system and an alignment method capable of achieving a higher-accuracy alignment, with an alignment mark position detected without interference with an exposure EB and without the need of tilting the optical axis significantly. The alignment system is provided with an optical system for optically detecting alignment marks respectively provided to an exposure mask (1) and a wafer (2) as an element to be exposed, and relatively aligns the exposure mask (1) with the wafer (2) based on the detection result by the optical system, wherein a slit (31) for restricting a light flux on a light path and a light axis converting means for bending the light axis direction of the light path are provided on the light path of the optical system, whereby it is possible to detect alignment mark positions without interference with an exposure EB or the like because of bending by the light axis converting means that eliminates the need of a largely tilted incident angle with respect to alignment marks.