发明名称 Polishing articles for electrochemical mechanical polishing of substrates
摘要 An article of manufacture, method, and apparatus are provided for planarizing a substrate surface. In one aspect, an article of manufacture is provided for polishing a substrate including a polishing article (205) having a body comprising at least a portion (310) of fibers coated with a conductive material, conductive fillers, or combinations thereof, and adapted to polish the substrate. In another aspect, a polishing article includes a body having a surface adapted to polish the substrate and at least one conductive element embedded in the polishing surface, the conductive element comprising dielectric or conductive fibers coated with a conductive material, conductive fillers, or combinations thereof. The conductive element may have a contact surface that extends beyond a plane defined by the polishing surface. A plurality of perforations (546) and a plurality of grooves (542) may be formed in the articles to facilitate flow of material through and around the polishing article. <IMAGE>
申请公布号 EP1361023(A2) 申请公布日期 2003.11.12
申请号 EP20030252801 申请日期 2003.05.02
申请人 APPLIED MATERIALS, INC. 发明人 HU, YONGQI;WANG, YAN;DUBOUST, ALAIN;LIU, FENG Q.;MAVLIEV, RASHID;CHEN, LIANG-YUH;MORAD, RATSON;SOMEKH, SASSON
分类号 C25D7/12;B23H5/08;B24B37/04;B24D13/14;C25F3/00;C25F3/30;C25F7/00;H01L21/304;(IPC1-7):B24D13/14;H01L21/321 主分类号 C25D7/12
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