发明名称 METHODS OF METAL COATING CONTACT HOLES IN MEMS AND SIMILAR APPLICATIONS
摘要 A method of coating contact holes in MEMS and micro-machining applications comprises: providing an insulating layer above an integrated circuit; providing a resist layer above the insulating layer; patterning and developing the resist layer in order to form at least one contact aperture in the resist layer; isotropically etching the insulating layer using the resist layer as a mask, so that a contact hole is formed in the insulating layer; and coating the walls of said contact hole with a layer of metal. <IMAGE>
申请公布号 EP1361192(A2) 申请公布日期 2003.11.12
申请号 EP20030100793 申请日期 2003.03.27
申请人 ZARLINK SEMICONDUCTOR LIMITED 发明人 MARTIN, BRIAN;PERRING, JOHN;SHANNON, JOHN
分类号 B81B7/00;H01L21/768;(IPC1-7):B81C1/00 主分类号 B81B7/00
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