发明名称 |
METHODS OF METAL COATING CONTACT HOLES IN MEMS AND SIMILAR APPLICATIONS |
摘要 |
A method of coating contact holes in MEMS and micro-machining applications comprises: providing an insulating layer above an integrated circuit; providing a resist layer above the insulating layer; patterning and developing the resist layer in order to form at least one contact aperture in the resist layer; isotropically etching the insulating layer using the resist layer as a mask, so that a contact hole is formed in the insulating layer; and coating the walls of said contact hole with a layer of metal. <IMAGE>
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申请公布号 |
EP1361192(A2) |
申请公布日期 |
2003.11.12 |
申请号 |
EP20030100793 |
申请日期 |
2003.03.27 |
申请人 |
ZARLINK SEMICONDUCTOR LIMITED |
发明人 |
MARTIN, BRIAN;PERRING, JOHN;SHANNON, JOHN |
分类号 |
B81B7/00;H01L21/768;(IPC1-7):B81C1/00 |
主分类号 |
B81B7/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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