发明名称 MOSFET having a double gate
摘要 A double gate MOSFET. The MOSFET includes a bottom gate electrode and a bottom gate dielectric disposed over the bottom gate electrode. A semiconductor body region is disposed over the bottom gate dielectric and the bottom gate electrode, and disposed between a source and a drain. A top gate electrode is disposed over the body. A top gate dielectric separates the top gate electrode and the body, the top gate electrode and the bottom gate electrode defining a channel within the body and interposed between the source and the drain. At least one of the bottom gate dielectric or the top gate dielectric is formed from a high-K material. A method of forming a double gate MOSFET is also disclosed where a semiconductor film used to form a body is recrystallized using a semiconductor substrate as a seed crystal.
申请公布号 US6646307(B1) 申请公布日期 2003.11.11
申请号 US20020081362 申请日期 2002.02.21
申请人 ADVANCED MICRO DEVICES, INC. 发明人 YU BIN;PATON ERIC N.
分类号 H01L21/336;H01L29/786;(IPC1-7):H01L27/01;H01L27/12;H01L31/039 主分类号 H01L21/336
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