发明名称 Semiconductor integrated circuit and method for manufacturing the same
摘要 A semiconductor integrated circuit has a MOS transistor formed on an SOI substrate and a subsidiary transistor provided between a body node and a drain node of the MOS transistor and sharing a gate electrode with the MOS transistor, whereby the body potential of the MOS transistor is controlled by gate and drain potentials. Accumulated body charge in a non-conducting state in the semiconductor integrated circuit is extracted by a resistor formed between the body node and a source, whereby various phenomena caused by the floating body effect are eliminated. The threshold voltage of the MOS transistor can be made variable so as to follow a change in an input signal.
申请公布号 US6646296(B2) 申请公布日期 2003.11.11
申请号 US20020216443 申请日期 2002.08.12
申请人 HITACHI, LTD. 发明人 HORIUCHI MASATADA
分类号 H01L29/78;H01L21/8234;H01L21/84;H01L27/088;H01L27/12;H01L29/76;H01L29/786;H01L29/94;H01L31/062;H01L31/072;H01L31/113;H01L31/119;(IPC1-7):H01L29/76 主分类号 H01L29/78
代理机构 代理人
主权项
地址