| 发明名称 |
Method of forming coating film, method of manufacturing semiconductor device and coating solution |
| 摘要 |
A coating solution for used in a scan coating method contains a low vapor pressure solvent having a vapor pressure lower than 1 Torr (133.322 Pa) at room temperature.
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| 申请公布号 |
US6645881(B2) |
申请公布日期 |
2003.11.11 |
| 申请号 |
US20020112951 |
申请日期 |
2002.04.02 |
| 申请人 |
KABUSHIKI KAISHA TOSHIBA;JSR CORPORATION |
发明人 |
YAMADA NOBUHIDE;NAKATA REMPEI;SUGIURA MAKOTO;YOSHIOKA MUTSUHIKO;KITANO TAKAHIRO;KOBAYASHI SHINJI |
| 分类号 |
G03F7/16;B05D1/26;B05D1/30;B05D3/00;B05D7/00;C09D183/04;C09D183/14;C23C18/12;H01L21/027;H01L21/312;H01L21/316;(IPC1-7):H01L21/31;H01L21/469;B05D3/12 |
主分类号 |
G03F7/16 |
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