发明名称 STRUCTURE OF PLASMA GENERATION ANTENNA INCLUDING INDUCTIVE ANTENNA AND PLASMA GENERATOR USING INDUCTIVE ANTENNA
摘要 PURPOSE: A structure of a plasma generation antenna including an inductive antenna and a plasma generator using an inductive antenna are provided to form uniformly the non-uniform RF(Radio Frequency) field due to a coil antenna by using additionally an inductive antenna. CONSTITUTION: A structure of a plasma generation antenna including an inductive antenna includes a coil antenna(110), an inductive antenna(120), and a dielectric. The coil antenna(110) is installed nearly to the outside of a vacuum chamber in order to generate RF(Radio Frequency) signals by means of RF power. The inductive antenna(120) is used for covering a part of the coil antenna(110) in order to induct the RF signals. The dielectric is used for filling a gap between the coil antenna(110) and the inductive antenna(120). The structure of the plasma generation antenna including the inductive antenna further includes a compensation antenna(130). The compensation antenna(130) is installed at the outside of the coil antenna(110) to receive the induced RF power.
申请公布号 KR20030085932(A) 申请公布日期 2003.11.07
申请号 KR20020024239 申请日期 2002.05.02
申请人 INNOVATION FOR CREATIVE DEVICES CO., LTD. 发明人 LEE, SEUNG HO
分类号 H05H1/34;(IPC1-7):H05H1/34 主分类号 H05H1/34
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