发明名称 |
STRUCTURE OF PLASMA GENERATION ANTENNA INCLUDING INDUCTIVE ANTENNA AND PLASMA GENERATOR USING INDUCTIVE ANTENNA |
摘要 |
PURPOSE: A structure of a plasma generation antenna including an inductive antenna and a plasma generator using an inductive antenna are provided to form uniformly the non-uniform RF(Radio Frequency) field due to a coil antenna by using additionally an inductive antenna. CONSTITUTION: A structure of a plasma generation antenna including an inductive antenna includes a coil antenna(110), an inductive antenna(120), and a dielectric. The coil antenna(110) is installed nearly to the outside of a vacuum chamber in order to generate RF(Radio Frequency) signals by means of RF power. The inductive antenna(120) is used for covering a part of the coil antenna(110) in order to induct the RF signals. The dielectric is used for filling a gap between the coil antenna(110) and the inductive antenna(120). The structure of the plasma generation antenna including the inductive antenna further includes a compensation antenna(130). The compensation antenna(130) is installed at the outside of the coil antenna(110) to receive the induced RF power.
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申请公布号 |
KR20030085932(A) |
申请公布日期 |
2003.11.07 |
申请号 |
KR20020024239 |
申请日期 |
2002.05.02 |
申请人 |
INNOVATION FOR CREATIVE DEVICES CO., LTD. |
发明人 |
LEE, SEUNG HO |
分类号 |
H05H1/34;(IPC1-7):H05H1/34 |
主分类号 |
H05H1/34 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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