发明名称 APPARATUS FOR VAPORIZING LIQUID SOURCE
摘要 PURPOSE: An apparatus for vaporizing liquid source is provided to obtain a high vaporization efficiency by changing channel through which liquid source passes. CONSTITUTION: In a liquid source vaporization apparatus which is connected to liquid source supply pipe(12) for supplying liquid source to vaporize the liquid source supplied from the liquid source supply pipe(12) and supply the vaporized liquid source to a semiconductor fabrication equipment, the apparatus for vaporizing the liquid source comprises a sprayer(14) comprising an inlet for receiving the liquid source from the liquid source supply pipe(12) and an outlet oppositely directed to the inlet to discharge the liquid source flown into the sprayer(14) through the inlet using hydraulic pressure; an inner guiding pipe(18') comprising a channel(19) which is formed in a cylindrical shape having shorter diameter than the outlet so that the channel is inserted into the outlet, an inserting part of which has a sharp end so that the liquid source easily discharged in a streamline flow through the outlet, in which a stepped projection part is formed on the circumference of a part of the channel correspondingly positioned to the outlet so that a gap between the outlet and channel is narrowed, and on the outer circumferential surface of which a spiral groove is formed so that the liquid source passes through the spiral groove; an outer guiding pipe the inner circumferential surface of which cohesively surrounds the outer circumferential surface of the inner guiding pipe(18'); and a heating means for surrounding the outer guiding pipe to thermal vaporize the liquid source passing through the channel(19).
申请公布号 KR20030085823(A) 申请公布日期 2003.11.07
申请号 KR20020024106 申请日期 2002.05.02
申请人 JU SUNG ENGNEERING CO., LTD. 发明人 BAEK, HYEON U;BANG, HYEON IL
分类号 C23C16/00;(IPC1-7):C23C16/00 主分类号 C23C16/00
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