| 摘要 |
PROBLEM TO BE SOLVED: To provide an inexpensive and simple projection aligner which can form a pattern by exactly aligning the pattern to a substrate to be projected. SOLUTION: The positions of a pattern substrate and supporting means are so adjusted that the first reference mark disposed on the pattern substrate and a second reference mark disposed at the supporting means for supporting the substrate to be projected satisfy the prescribed relation in the first detecting means and the second reference mark when the prescribed relation is satisfied is detected by a second detecting means. COPYRIGHT: (C)2004,JPO |
