| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a production method of a TFT matrix type liquid crystal display device which prevents the irregularities of display on a screen caused when one total pattern which is regularly arranged by connecting the patterns by the use of plural sheets of exposure masks is formed. <P>SOLUTION: A resist film is formed on a film on a substrate having a first region, a second region and a third region placed between the first region and the second region, the film is patterned by the use of photolithography using a first exposure mask and a second exposure mask and the total patterned film is formed in such a manner that the boundary line between the patterned film relating to the first exposure mask and the patterned film relating to the second exposure mask is made rugged. Such a process above mentioned is applied at least for two different films and, thereby, at least two different layers 12, 20a and 20b are formed. <P>COPYRIGHT: (C)2004,JPO</p> |
