MASK MATERIAL FOR EXPOSURE

摘要

PROBLEM TO BE SOLVED: To provide a mask material for exposure excellent in reproducibility of a fine image and capable of easily manufacturing a mask for exposure. SOLUTION: In the mask material for exposure having at least a silver halide emulsion layer on a glass substrate, a relief image is formed by tanning development, the thickness of the silver halide emulsion layer is 0.5-5μm and the maximum density of the image portion is≥3. Preferably a low molecular weight gelatin or/and a tanning developer are contained in the silver halide emulsion layer or the like,≥5×10-3mol/m2silver halide emulsion grains are contained and thickness corresponding to 5×10-3mol/m2of the grains is≤2μm, the sensitivity of the lower layer of the silver halide emulsion layer is higher than that of the upper layer, a metal oxide layer is included, or a silver halide emulsion is removed by a process not including contact. COPYRIGHT: (C)2004,JPO