发明名称 |
ETCHING LIQUID, ETCHING TREATMENT METHOD OF GLASS SUBSTRATE AND REPRODUCING TREATMENT METHOD OF ETCHING LIQUID |
摘要 |
PROBLEM TO BE SOLVED: To solve the problem that clogging occurs in a filtering stage, in piping or a tank by gelatinous solid matter produced in an etching liquid for etching a glass substrate when it is reproductively utilized. SOLUTION: An etching liquid obtained by adding a barium compound to a hydrofluoric acid-containing etching liquid is used when the surface of a glass substrate is subjected to etching treatment. Further, solid matter containing components eluted from the glass substrate is separated and removed from the etching solution by adding a barium-containing solution to the etching liquid after the etching treatment. COPYRIGHT: (C)2004,JPO
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申请公布号 |
JP2003313049(A) |
申请公布日期 |
2003.11.06 |
申请号 |
JP20020117631 |
申请日期 |
2002.04.19 |
申请人 |
ASAHI GLASS CO LTD |
发明人 |
AKIYAMA RYOJI;TAKENAKA ATSUYOSHI;KASE JUNICHIRO |
分类号 |
C03C15/00;(IPC1-7):C03C15/00 |
主分类号 |
C03C15/00 |
代理机构 |
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