发明名称 ETCHING LIQUID, ETCHING TREATMENT METHOD OF GLASS SUBSTRATE AND REPRODUCING TREATMENT METHOD OF ETCHING LIQUID
摘要 PROBLEM TO BE SOLVED: To solve the problem that clogging occurs in a filtering stage, in piping or a tank by gelatinous solid matter produced in an etching liquid for etching a glass substrate when it is reproductively utilized. SOLUTION: An etching liquid obtained by adding a barium compound to a hydrofluoric acid-containing etching liquid is used when the surface of a glass substrate is subjected to etching treatment. Further, solid matter containing components eluted from the glass substrate is separated and removed from the etching solution by adding a barium-containing solution to the etching liquid after the etching treatment. COPYRIGHT: (C)2004,JPO
申请公布号 JP2003313049(A) 申请公布日期 2003.11.06
申请号 JP20020117631 申请日期 2002.04.19
申请人 ASAHI GLASS CO LTD 发明人 AKIYAMA RYOJI;TAKENAKA ATSUYOSHI;KASE JUNICHIRO
分类号 C03C15/00;(IPC1-7):C03C15/00 主分类号 C03C15/00
代理机构 代理人
主权项
地址