| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To prevent residual air from remaining in the atmosphere in a photomask. <P>SOLUTION: Disclosed is a photomask comprising a patterned substrate, a pellicle membrane stretched in such a way that it confronts the surface of the substrate at a prescribed interval and a frame which holds the pellicle membrane and encloses the space between the pellicle membrane and the photomask substrate, wherein the frame has an opening and this opening is provided with a lid capable of blocking up the opening. The pellicle membrane and the frame are attached to the substrate in an inert gas and the space in the photomask is made airtight by the lid. <P>COPYRIGHT: (C)2004,JPO</p> |
