| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a method for manufacturing an optical element with high mass productivity. <P>SOLUTION: The method for manufacturing the optical element is provided with the first mask setting up step (S20) to set up the first one-dimensional mask having a one-dimensionally aligned mask pattern on an object surface of a projection system, a substrate setting up step (S21) to set up a photosensitive optical material on a stage, the first exposing step (S23) to form the pattern shape of the first one-dimensional mask on the photosensitive optical material with exposure, the second mask setting up step (S24) to set up the second one- dimensional mask of which the alignment direction of the mask pattern is rotationally shifted with a specified angle with respect to the alignment direction of the mask pattern of the first one-dimensional mask set up in the first mask setting up step on the object surface of the projection system, the second exposing step (S25) to form the pattern shape of the second one-dimensional mask on the photosensitive optical material with exposure, a development step (S26) to develop the photosensitive optical material exposed in the first and second exposing steps and an etching step (S27) to etch the photosensitive optical material developed in the development step. <P>COPYRIGHT: (C)2004,JPO</p> |
