发明名称 METHOD FOR MANUFACTURING ANTIREFLECTION FILM
摘要 <P>PROBLEM TO BE SOLVED: To provide an excellent antireflection film having no failure of the coating surface and high production yield while having sufficient antireflection performance. <P>SOLUTION: In the method for manufacturing an antireflection film by applying the respective coating liquids for at least one hard coat layer and a low refractive index layer in the outermost position on a transparent supporting body and drying, after the coating liquids for the hard coat layer and the low refractive index layer are applied, the process of setting the coating films is completed in a first drying zone kept at the temperature of &ge;10&deg;C and &le;40&deg;C. <P>COPYRIGHT: (C)2004,JPO
申请公布号 JP2003315505(A) 申请公布日期 2003.11.06
申请号 JP20020316457 申请日期 2002.10.30
申请人 FUJI PHOTO FILM CO LTD 发明人 IKEYAMA AKIHIRO;MATSUNAGA TADAHIRO
分类号 G02B1/11;B32B7/02 主分类号 G02B1/11
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