DOWNWARD METAL FILM DEPOSITION APPARATUS AND METHOD FOR MANUFACTURING ORGANIC SEMICONDUCTOR

摘要

PURPOSE: A downward metal film deposition apparatus and a method for manufacturing organic semiconductor are provided to be capable of preventing thermal damage from being generated at an organic layer and improving the uniformity of a deposition layer. CONSTITUTION: A downward metal film deposition apparatus is provided with a scan head part(10) connected to a power supply(90), a metal supply part for continuously supplying metal to a resistance heating source of the scan head part, a scan head spin part for rotating the resistance heating source, and a quartz oscillator(40) installed at the lower portion of the scan head part for controlling the deposition speed of vapor. The downward metal film deposition apparatus further includes a driving part(50) for moving the scan head part, a shutter part(60) for restraining the increase of substrate temperature, and a substrate cooling and heating part(70) for conserving the substrate temperature to a predetermined point.