发明名称 |
Management system and apparatus, method therefor, and device manufacturing method |
摘要 |
<p>A management apparatus which manages a parameter for an industrial device acquires AGA measurement results obtained by operating the industrial device with an operation job parameter value and non-operation job parameter value. An inspection apparatus acquires an "inspection result" obtained by inspecting the result of operating the industrial device in the operation job. A change in inspection result upon a change in parameter value is estimated on the basis of the AGA measurement result and inspection result. A variable which minimizes (extreme) both or at least one of the sensitivity (slope) of the inspection result upon a change in parameter value and variations (3Ã) in inspection result between objects to be processed (e.g., wafers) is set as an optimal parameter.</p> |
申请公布号 |
EP1359470(A2) |
申请公布日期 |
2003.11.05 |
申请号 |
EP20030009608 |
申请日期 |
2003.04.29 |
申请人 |
CANON KABUSHIKI KAISHA |
发明人 |
OISHI, SATORU;INA, HIDEKI;SUZUKI, TAKEHIKO;SENTOKU, KOICHI;MATSUMOTO, TAKAHIRO |
分类号 |
G03F9/00;G03F7/20;G05B19/418;H01L21/027;(IPC1-7):G03F9/00 |
主分类号 |
G03F9/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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