发明名称 Management system and apparatus, method therefor, and device manufacturing method
摘要 <p>A management apparatus which manages a parameter for an industrial device acquires AGA measurement results obtained by operating the industrial device with an operation job parameter value and non-operation job parameter value. An inspection apparatus acquires an "inspection result" obtained by inspecting the result of operating the industrial device in the operation job. A change in inspection result upon a change in parameter value is estimated on the basis of the AGA measurement result and inspection result. A variable which minimizes (extreme) both or at least one of the sensitivity (slope) of the inspection result upon a change in parameter value and variations (3Ã) in inspection result between objects to be processed (e.g., wafers) is set as an optimal parameter.</p>
申请公布号 EP1359470(A2) 申请公布日期 2003.11.05
申请号 EP20030009608 申请日期 2003.04.29
申请人 CANON KABUSHIKI KAISHA 发明人 OISHI, SATORU;INA, HIDEKI;SUZUKI, TAKEHIKO;SENTOKU, KOICHI;MATSUMOTO, TAKAHIRO
分类号 G03F9/00;G03F7/20;G05B19/418;H01L21/027;(IPC1-7):G03F9/00 主分类号 G03F9/00
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