发明名称 MANUFACTURING METHOD OF PROBE, MASK FOR MANUFACTURING PROBE AND PROBE
摘要 A method is disclosed for producing a probe capable of keeping sure electric conduction between the probe and a conductive pad. The method comprises the steps of: applying photo resists 500 onto the front and rear faces of a conductive plate-form material 400 which is to make a probe 100; masking one face of the plate-form material 400 with a first mask 200, and masking the other face of the plate-form material 400 with a second mask 300; subjecting the photo resists 500 to exposure to light and development; and using the photo resists 500 remaining in the exposure and development the step as mask materials 510 to etch the plate-form material 400. <IMAGE>
申请公布号 KR20030084754(A) 申请公布日期 2003.11.01
申请号 KR20030026254 申请日期 2003.04.25
申请人 发明人
分类号 H01L21/66;G01R1/067;G01R1/073;G01R3/00;G01R31/28 主分类号 H01L21/66
代理机构 代理人
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