| 摘要 |
PURPOSE: A chuck assembly in equipment for etching a semiconductor device is provided to expand the lifetime of a focus ring by controlling the height of the focus ring so that the upper surface of the focus ring maintains a uniform height. CONSTITUTION: The focus ring(32a,32b,32c) is of a type that covers the upper surface and side part of a step of an upper edge of an electrostatic chuck(16). The lower portion of the focus ring is installed in a position adjacent to a base(22), confronting the base. A plurality of through holes(34a,34b,34c) are formed in the upper portion of the focus ring, confronting the base. A screw assembly(36a,36b,36c) is installed in each through hole of the focus ring, supported by the base. The screw assembly supports the ascending and descending position of the focus ring according to a rotation angle.
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