发明名称 LASER MARKING METHOD AND PHOTOSENSITIVE MATERIAL
摘要 <P>PROBLEM TO BE SOLVED: To provide a laser marking method which facilitates quantitative estimation of visibility, maintains original enhancement of the image quality of a photosensitive material and to enhances the visibility of a dot pattern. <P>SOLUTION: A region where fine bubbles 16B are formed can be enlarged by making a dot pattern 16A convex, and since a plurality of fine bubbles 16B are formed, irregular reflection of light is promoted at a boundary film between the bubbles 16B, and the inside and outside of the dot pattern 16A can be made markedly different from each other in reflectance. The visibility of the dot pattern 16A is therefore enhanced independently of the density distribution of an X-ray film 12. In order to dispose a plurality of fine bubbles 16B in the convex dot pattern 16A, laser beam irradiation time is adjusted to 6 to 15 &mu;s when the oscillation wavelength of a laser oscillator 44 is in a 9 &mu;m band. When a post-development state is taken into consideration, the laser beam irradiation time is preferably 6 to 10 &mu;s. <P>COPYRIGHT: (C)2004,JPO
申请公布号 JP2003307813(A) 申请公布日期 2003.10.31
申请号 JP20020111938 申请日期 2002.04.15
申请人 FUJI PHOTO FILM CO LTD 发明人 ENDO KEISUKE;NISHIDA HIROYUKI
分类号 B41J2/44;B41M5/26;G03C1/765 主分类号 B41J2/44
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