| 摘要 |
PROBLEM TO BE SOLVED: To provide a method of producing a Co based sputtering target consisting of cobalt or a cobalt based alloy which has high magnetic anisotropy and is hard to be cracked. SOLUTION: The method of producing a Co based sputtering target includes: a forming stage where cobalt or a cobalt based alloy is subjected to hot working at 1,050 to 1,250°C to be formed into a formed body having a required shape; a warm working stage where the formed body is subjected to warm working in a temperature range less than the phase transformation point betweenαCo andεCo in the cobalt or cobalt based alloy; and a heat treatment stage where the formed body after the warm working is heated and kept in a temperature range less than the above phase transformation point of the cobalt or cobalt based alloy and is held. COPYRIGHT: (C)2004,JPO
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