| 摘要 |
PROBLEM TO BE SOLVED: To materialize an environmental symbiotic technology which forms a liquid film on a resist, thereby dissolving and removing the resist by utilizing an active oxygen produced in the liquid film, and gets out of a resources and energy fairly consuming technology, namely does not depend on high energy or a chemical solvent in removing the resist. SOLUTION: By a down moving mechanism 2b of a substrate stage 2, a distance between the surface of a substrate 10 and an ultraviolet rays transmission plate 3 is adjusted to a predetermined distance, and O<SB>3</SB>water is supplied from an O<SB>3</SB>water supply part 12 to a process space formed between the surface of the substrate 10 of a process chamber 1 and the ultraviolet rays transmission plate 3, to form a liquid film 41. Ultraviolet rays having a wavelength of 172 nm to 310 nm are irradiated on this liquid film 41 by an ultraviolet rays lamp to decompose O<SB>3</SB>to generate various kinds of active oxygen, thereby dissolving and removing the resist. COPYRIGHT: (C)2004,JPO |
