METHOD AND SYSTEM FOR ROTATING A SEMICONDUCTOR WAFER IN PROCESSING CHAMBERS,申请号EP20020715627-传众专利搜索

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发明名称	METHOD AND SYSTEM FOR ROTATING A SEMICONDUCTOR WAFER IN PROCESSING CHAMBERS
摘要
申请公布号	EP1356503(A2)	申请公布日期	2003.10.29
申请号	EP20020715627	申请日期	2002.01.24
申请人	MATTSON THERMAL PRODUCTS INC.	发明人	KOREN, ZION;MA, YORKMAN;CARDENA, RUDY, SANTO, TOMAS;TAOKA, JAMES, TSUNEO;WRIDE, LOIS;MC FARLAND, CRAIG;GIBSON, SHARON
分类号	B05C11/08;C23C16/458;H01L21/00;H01L21/687;(IPC1-7):H01L21/00	主分类号	B05C11/08
代理机构		代理人
主权项
地址

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