SUBSTRATE PROCESSING DEVICE AND PROCESSING METHOD

摘要

PROBLEM TO BE SOLVED: To provide a processing device which can prevent take-out of the peeling liquid from a peeling chamber by a substrate processed in the peeling chamber. SOLUTION: This processing device for processing substrates with the processing liquid is equipped with carrying rollers 12 provided in carrying shafts 11 for carrying the substrates in the predetermined direction, and the peeling chamber 4 for processing the substrates to be carried by the carrying roller. The substrate is tilted so that a front side thereof in the carrying direction becomes higher than a rear side thereof when carrying out the substrates from the peeling chamber 4 to eliminate the processing liquid left in the top surface of the substrates. COPYRIGHT: (C)2004,JPO