发明名称 Semiconductor device
摘要 In a semiconductor substrate, semiconductor regions belonging to the IGBT are formed in an IGBT region and semiconductor regions belonging to the diode are formed in a diode region. The IGBT and the diode are connected in anti-parallel to each other. A trench in which an insulator is buried is formed between the IGBT region and the diode region. The insulator restricts the reverse recovery current which flows from the diode region into the IGBT region. Thus, semiconductor regions of an IGBT and a diode connected in anti-parallel with each other are fabricated in a single semiconductor substrate and the chip size is reduced.
申请公布号 US6639295(B2) 申请公布日期 2003.10.28
申请号 US20010954172 申请日期 2001.09.18
申请人 MITSUBISHI DENKI KABUSHIKI KAISHA 发明人 MAJUMDAR GOURAB;HATAE SHINJI;YAMAMOTO AKIHISA
分类号 H01L29/78;H01L21/76;H01L27/04;H01L29/739;(IPC1-7):H01L29/00;H01L23/62;H01L27/01;H01L27/12 主分类号 H01L29/78
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