发明名称 INSULATED GATE THIN FILM TRANSISTOR AND ITS CONTROLLING METHOD
摘要 PROBLEM TO BE SOLVED: To electronically control the gate threshold voltage of an insulated gate transistor fabricated in a semiconductor thin film where carriers are depleted between the first and second major surfaces of a full depletion type SOI. SOLUTION: A third opposite conductivity type semiconductor region is provided in contact with the semiconductor thin film and opposite conductivity type carriers are fed from the semiconductor region to the semiconductor thin film or opposite conductivity type carriers are extracted from the semiconductor thin film to the third semiconductor region thus controlling the quantity of carriers in the semiconductor thin film. COPYRIGHT: (C)2004,JPO
申请公布号 JP2003303972(A) 申请公布日期 2003.10.24
申请号 JP20020108422 申请日期 2002.04.10
申请人 SEIKO INSTRUMENTS INC;HAYASHI YUTAKA 发明人 HAYASHI YUTAKA;HASEGAWA TAKASHI;YOSHIDA YOSHIFUMI;OSANAI JUN
分类号 H01L27/08;H01L21/8234;H01L21/8238;H01L21/84;H01L27/088;H01L27/092;H01L27/12;H01L29/786;(IPC1-7):H01L29/786;H01L21/823 主分类号 H01L27/08
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