发明名称 Thin-film semiconductor epitaxial substrate and process for production thereof
摘要 A thin-film semiconductor epitaxial substrate comprising a substrate and a sub-collector layer, a collector layer, a base layer and an emitter layer(s) which are formed as thin-film semiconductor epitaxial layers on said substrate, wherein boron (B) added is present in at least a part of a layer portion comprising said sub-collector layer and said collector layer.
申请公布号 US2003197185(A1) 申请公布日期 2003.10.23
申请号 US20030394068 申请日期 2003.03.24
申请人 HIROYAMA YUICHI;TAKADA TOMOYUKI;ICHIKAWA OSAMU 发明人 HIROYAMA YUICHI;TAKADA TOMOYUKI;ICHIKAWA OSAMU
分类号 H01L21/331;H01L29/08;H01L29/737;(IPC1-7):H01L27/15 主分类号 H01L21/331
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