发明名称 Patterning method, patterning apparatus, patterning template, and method for manufacturing the patterning template
摘要 A template 1 is brought close to or in contact with a surface to be patterned 111 and patterns are formed with liquid 62 on the surface 111. This method comprises the steps of: bringing the template 1 close to or essentially in contact with the surface 111, supplying liquid 62 to a plurality of through holes 12 established in the pattern transfer region 10 of the template 1 for supplying the liquid 62, and separating the template 1 from the surface 111 after the liquid 62 is adhered to the surface 111 via the through holes 12.
申请公布号 US2003198897(A1) 申请公布日期 2003.10.23
申请号 US20030424790 申请日期 2003.04.29
申请人 SEIKO EPSON CORPORATION 发明人 NEBASHI SATOSHI;NISHIKAWA TAKAO;SHIMODA TATSUYA
分类号 B41F17/14;B41J2/01;B41M1/12;G02F1/1335;G02F1/1343;G03F7/34;H01L21/30;H01L21/311;H01L21/3213;H05K3/10;H05K3/12;(IPC1-7):G03F7/16;G03F7/20;G03F7/40 主分类号 B41F17/14
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