| 摘要 |
PROBLEM TO BE SOLVED: To provide a treatment method of metal-based CMP (chemical mechanical polishing) waste water which enables the effective treatment by the use of a ceramic film even in the case of metal-based CMP waste water including metal ions. SOLUTION: When the metal-based CMP waste water comprising the metal ions, an oxidizer and CMP slurry is treated with the ceramic film, a hydroxide is added to the CMP waste water to be treated, pH adjustment is performed, colloidal metal hydroxides are formed and, thereafter, the separation by the use of the ceramic film is performed. COPYRIGHT: (C)2004,JPO
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