发明名称 METHOD FOR MANUFACTURING FUSE LINE
摘要 PURPOSE: A method for manufacturing a fuse line is provided to be capable of improving die ID function fail and laser repair fail by using a stopping layer made of nitride. CONSTITUTION: A stopping layer(12) made of nitride is formed on entire surface of an insulating layer(10). The first, second and third conductive layer are sequentially stacked on the stopping layer(12). A fuse line is formed by patterning the third, second and first conductive layer. An oxide layer(20) is formed on the entire surface of the resultant structure. A photoresist pattern(22) is formed on the resultant structure. The oxide layer(20) is then selectively removed by using the photoresist pattern(22) as a mask.
申请公布号 KR20030080333(A) 申请公布日期 2003.10.17
申请号 KR20020018908 申请日期 2002.04.08
申请人 ANAM SEMICONDUCTOR., LTD. 发明人 KIM, HYEONG SEOK
分类号 H01L21/82;(IPC1-7):H01L21/82 主分类号 H01L21/82
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