发明名称 LEAD FRAME FOR SEMICONDUCTOR DEVICE
摘要 <p><P>PROBLEM TO BE SOLVED: To provide a lead frame for semiconductor device by which Pb liberalization, dry process making, a suppression in natural erosion are realized simultaneously without changing conventional production equipment in an assembling process. <P>SOLUTION: On a base material 1 based on Fe, a barrier layer 3 consisting of a metal whose standard electrode potential is not higher than -0.44 V, an Ni layer 4, a Pd layer 5 are formed in order, and an Au layer 6 is formed on the most surface. <P>COPYRIGHT: (C)2004,JPO</p>
申请公布号 JP2003297993(A) 申请公布日期 2003.10.17
申请号 JP20020097045 申请日期 2002.03.29
申请人 TOSHIBA CORP 发明人 IKEBE HIROSHI
分类号 H01L23/50;(IPC1-7):H01L23/50 主分类号 H01L23/50
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