DEVICE AND METHOD FOR TREATING SUBSTRATE

摘要

PROBLEM TO BE SOLVED: To provide a device for treating a substrate in which the substrate can be treated uniformly by treatment liquid. SOLUTION: The device for treating the surface of a substrate W by jetting treatment liquid thereto comprises a carrying shaft 4 having a roller 5 for carrying the substrate along a specified direction, and a plurality of nozzles 21 arranged at least in the direction intersecting the carrying direction of substrate out of the carrying direction and the intersecting direction at a specified interval above the substrate being carried and jetting the treatment liquid to the substrate in a rectangular pattern such that side parts of adjacent rectangular patterns are overlapped. COPYRIGHT: (C)2004,JPO