| 摘要 |
PROBLEM TO BE SOLVED: To provide a device and a method for treating a substrate in which an increase in drying cost can be controlled without generating a water mark. SOLUTION: When a fluorine based solvent, i.e., HFE (hydrofluoroether), is supplied from a nozzle 50 for ejecting a drying agent while rotating a cleaned substrate W held on a rotor 30, pure water on the substrate W is shaken off by a centrifugal force and the HFE evaporates quickly together with water drops entering a fine pattern formed on the substrate W. Consequently, drying performance can be enhanced while controlling the failure of drying in the fine pattern. COPYRIGHT: (C)2004,JPO
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