发明名称 BAND GAP PLASMA MASS FILTER
摘要 <P>PROBLEM TO BE SOLVED: To provide an apparatus and method for selectively setting a predetermined orbit in such a manner that an electric field crosses a substantially uniform magnetic field (E x B) against an ion of a first mass/charge ratio (m<SB>1</SB>) with respect to an axis. <P>SOLUTION: A magnetic field is directed along an axis, and an electric field has both DC voltage component (&Phi;<SB>0</SB>) and AC voltage component (&Phi;<SB>1</SB>). In an operation, when &Phi;<SB>1</SB>is zero, the voltage &Phi;<SB>0</SB>is fixedly set for the purpose of positioning an ion (m<SB>1</SB>) on a limited orbit about the axis. When &Phi;<SB>1</SB>is adjusted to a predetermined value on the other hand, the ion (m<SB>1</SB>) is discharged away from the axis. (E x B) is set within a chamber, whereby the ion (m<SB>1</SB>) is passed through the chamber at the limited orbit (&Phi;<SB>1</SB>=0), while the ion (m<SB>1</SB>) is radiated onto the wall of the chamber whereon the unlimited orbit (&Phi;<SB>1</SB>=predetermined value). <P>COPYRIGHT: (C)2004,JPO
申请公布号 JP2003297281(A) 申请公布日期 2003.10.17
申请号 JP20020371840 申请日期 2002.12.24
申请人 ARCHIMEDES TECHNOLOGY GROUP INC 发明人 OHKAWA TIHIRO
分类号 G01N27/62;C23C14/54;C23C16/50;H01J49/28;H01J49/42;H05H1/24 主分类号 G01N27/62
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