发明名称 NEW PHOTOSENSITIVE COMPOUND AND PHOTOSENSITIVE RESIN AND PHOTOSENSITIVE COMPOSITION
摘要 <P>PROBLEM TO BE SOLVED: To provide a new photosensitive compound having an azido group suitable for an exposure light source at a short wavelength, a photosensitive resin using the same and a photosensitive composition comprising the photosensitive compound or photosensitive resin. <P>SOLUTION: The photosensitive compound comprises a photosensitive group unit represented by general formula (1) (wherein, R is selected from the formulae; X is selected from the formulae; and Y and Z are each a hydrogen atom, an alkyl group, an alkyl group having an acetal group, an aryl group, an aralkyl group or a substituent having a basic nitrogen) or is compound of the photosensitive group unit. In the photosensitive compound, R and X have at least one azido group. <P>COPYRIGHT: (C)2004,JPO
申请公布号 JP2003292477(A) 申请公布日期 2003.10.15
申请号 JP20020097971 申请日期 2002.03.29
申请人 TOYO GOSEI KOGYO KK 发明人 SHIBUYA TORU;KURIHARA MASANORI;TAKEDA MINEKO;YAMADA KAZUO
分类号 C07C247/18;C07D213/40;C07D213/56;C07D233/61;C08F2/46;C08F8/00;C08F8/30;G03F7/00;G03F7/008;G03F7/012 主分类号 C07C247/18
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