| 发明名称 |
ACETAL/ALICYCLIC POLYMER AND PHOTORESIST COMPOSITION |
| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide novel polymers which can afford excellent lithography characteristics. <P>SOLUTION: The photoresist composition containing the polymers that contain a photoactive component, an alicyclic unit and a photoacid-labile acetal unit. <P>COPYRIGHT: (C)2004,JPO |
| 申请公布号 |
JP2003295444(A) |
申请公布日期 |
2003.10.15 |
| 申请号 |
JP20020296564 |
申请日期 |
2002.10.09 |
| 申请人 |
SHIPLEY CO LLC |
发明人 |
TIMOTHY G ADAMS;COLEY SUZANNE |
| 分类号 |
G03F7/039;C08F216/38;H01L21/027 |
主分类号 |
G03F7/039 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
|
| 地址 |
|
