POLYMER BLEND AND RELATED METHODS FOR PREPARING AND USING THE SAME

摘要

PROBLEM TO BE SOLVED: To prepare a substantially homogeneous polymer blend suitable for use in photoresist compositions for lithography.

SOLUTION: The polymer blend is provided for use in the photoresist compositions (specifically, chemical amplification-type photoresists) for lithography. In a preferable embodiment, the polymer blend is substantially transparent for far-ultraviolet radiation (i.e., a radiation having >250 nm wavelengths including 157 nm, 193 nm and 248 nm wavelengths) and has improved photosensitivity and resolution. The respective processes for preparing and using the polymer blend are also provided as well as the photoresist compositions for lithography containing the polymer blend.

COPYRIGHT: (C)2004,JPO