| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a creeping discharge electrode enhancing the contact efficiency of plasma with gas and excellent in gas treatment efficiency, a gas treatment apparatus using the same and a gas treatment method. <P>SOLUTION: The creeping discharge electrode is equipped with an earth electrode 11, an insulator 12 and surface electrodes 13 and 13 and has a large number of through-holes 14, etc., formed thereto in parallel to each other in the direction vertical to the surfaces of the surface electrodes 13. The gas treatment apparatus has an electrode assembly 20 wherein the through-holes 14 of the creeping discharge electrode 10a and the through-holes 14 of the creeping discharge electrode 10b are arranged at different positions. In the electrode assembly 20, the longitudinal direction of the through-holes 14 is inclined so as to form an angle of 0°-60° with respect to the advance direction of the gas to be treated. In the gas treatment method, non-equilibrium plasma is generated on the surfaces of the creeping discharge electrodes 10a, 10b and 10c and in the through-holes 14 and the gas to be treated is allowed to flow along the surfaces of the creeping discharge electrodes 10a, 10b and 10c and through the through-holes 14 to be reacted with the non-equilibrium plasma. <P>COPYRIGHT: (C)2004,JPO |
