发明名称 |
Polymer-containing photoresist, and process for manufacturing the same |
摘要 |
The present invention relates to a semiconductor device using a copolymer-containing photoresist, and a process for manufacturing the same. As a norbornene derivative (monomer) having a hydrophilic group is synthesized and introduced to the backbone chain of a polymer, the polymer according to the present invention has excellent etching resistance and heat resistance, which are the characteristic points of alicyclic olefin structure, and provide excellent resolution due to prominent enhancement of adhesiveness resulted from introducing a hydrophilic group (-OH).</PTEXT>
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申请公布号 |
US6632903(B2) |
申请公布日期 |
2003.10.14 |
申请号 |
US20010934369 |
申请日期 |
2001.08.21 |
申请人 |
HYUNDAI ELECTRONICS INDUSTRIES CO., LTD. |
发明人 |
JUNG MIN HO;JUNG JAE CHANG;BOK CHEOL KYU;BAIK KI HO |
分类号 |
C07C67/347;C07C69/753;C08F4/04;C08F22/06;C08F32/00;C08F222/06;C08F232/08;G03F7/004;G03F7/027;(IPC1-7):C08F232/00;C08F134/02 |
主分类号 |
C07C67/347 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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