| 摘要 |
PURPOSE: A method for automatic operation of optical planning of multi-layer film is provided, which maximizes reduction effect of time and cost by automatically correcting theoretical design variables and experimental values, thereby obtaining a thin film having optical characteristics wanted by designer. CONSTITUTION: The method comprises a step(21) of depositing a thin film on substrate using a deposition equipment capable of continuously depositing the thin film; a step(22) of measuring reflectance spectrum of the thin film using spectrophotometer; a step(23) of inputting reflectivity measured according to set time intervals into control part; a step(24,25) of calculating standard deviation of the measured reflectivity and reflectance pre-stored in theoretical design part, repeatedly performing the foregoing steps in case that the standard deviation is not the minimum value, and repeating the deposition process using the next deposition material different from the previous deposition material to deposit the next layer after temporarily stopping the thin film deposition in case that the standard deviation is the minimum value; and a step(26) of completing the deposition process after finally performing the deposition process in case that the deposition material is a deposition material for depositing the final layer set by designer.
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