SPINNER EQUIPMENT HAVING APPARATUS FOR CLEANING WAFER TRANSFER ARM

摘要

PURPOSE: A spinner equipment is provided to be capable of automatically cleaning a wafer transfer arm by using a cleaning part installed in the spinner equipment. CONSTITUTION: A spinner equipment is provided with a coating part for coating photoresist on the surface of a wafer, a developing part for developing an exposed wafer, a wafer transfer apparatus(150) installed at the coating part and the developing part for transferring the wafer to a predetermined position, and a cleaning module(160) for automatically cleaning the wafer transfer apparatus. Preferably, the cleaning module includes a cleaning chamber(161) for loading a transfer arm(151) of the wafer transfer apparatus, a jet part(164) installed at the inner upper portion of the cleaning chamber for jetting a cleaning solution and dry gas onto the transfer arm, and a drain bath(165) installed at the inner lower portion of the cleaning chamber for draining the cleaning solution.