HIGH SELECTIVITY SILVER ETCHANT

摘要

PURPOSE: A high selectivity silver(Ag) etchant is provided, which is environmentally friendly, has proper etching ratio and good side etching amount and particularly has not any IZO attack by containing a large amount of water and 1 to 10 wt.% of hydrogen peroxide. CONSTITUTION: The silver(Ag) etchant comprises 1 to 10 wt.% of hydrogen peroxide; 0.1 to 4 wt.% of pH controlling agent; 0.1 to 5 wt.% of chelator; and a balance of water, wherein the pH controlling agent is one or more salts selected from the group consisting of diammonium citrate, ammonium acetate, ammonium dihydrogen phosphate, disodium citrate, sodium acetate and sodium hydrogen phosphate, and wherein the chelator is one or more acids selected from the group consisting of acetic acid, glycol acid, citric acid, oxalic acid and malonic acid.