SUSCEPTOR FOR SUPPORTING SEMICONDUCTOR SUBSTRATE AND PROCESSING APPARATUS HAVING THE SAME

摘要

PURPOSE: A susceptor for supporting a semiconductor substrate and a processing apparatus having the same are provided to be capable of preventing process gas from flowing to the rear surface of the semiconductor substrate by using a gas inflow preventing wall. CONSTITUTION: A susceptor(200) for supporting a semiconductor substrate is installed in a chamber, wherein the chamber is used for processing the semiconductor substrate. The susceptor is provided with a circular plate(202) for supporting the semiconductor substrate and a gas inflow preventing wall(204) installed at the upper portion of the circular plate for supporting the edge portion of the semiconductor substrate and preventing process gas from flowing between the semiconductor substrate and the plate.