| 摘要 |
<p>The invention relates to a system for optically treating surfaces, said system comprising a) a source (1,2) emitting a spatially modulated light beam from an emission side thereof, b) a periodical arrangement of light concentrating elements (3) arranged between the emission side of the source and a plane in which a surface of an object (4) to be treated must be arranged, c) the largest dimension of the emission side and/or the matrix of light concentrating elements being over 10 times larger than the distance (d2) separating said plane from the periodical arrangement of light concentrating elements and/or the emission side, and d) a support plate (5) for receiving the object (4) of which one side is to be treated in such a way that the side to be treated is parallel to the emission side of the source, the support plate enabling the object to be displaced in two first directions which are perpendicular in relation to each other and are located in the plane of the surface to be treated. The displacement step according to said two first directions is essentially equal to the distribution step of the periodical arrangement of light concentrating elements multiplied by the reduction ratio of the light concentrating elements. Preferably, the invention can be applied in the fields of micro-electronics, reprography, visualisation, and more generally, microtechnologies.</p> |
