| 摘要 |
<p>A vacuum deposition apparatus (101) and a method for depositing thin optical films made of a coating material on high curvature substrates (4) are described. The apparatus (101) of the invention comprises a vacuum chamber (2) in which are supported at least one evaporative device (20) for evaporating the coating material and a rotatable substrate holder (3) supported at a predetermined distance (D) from the evaporative device (20). The substrate holder (3) comprises a shaft (6) having a rotation axis (X-X) and a planetary turntable (7) including a plurality of rolls (8) for supporting said substrates (4).According to the invention, the evaporative device (20) is positioned substantially in alignment with the rotation axis (X-X) of the substrate holder (3) and the supporting rolls (8) radially extend from the shaft in an inclined manner towards the evaporative device (20) at an acute angle (α) with respect to a direction (Z-Z) substantially perpendicular to the rotation axis (X-X). Advantageously, the apparatus and the method of the invention enable to achieve an even deposition of the coating material on optical substrates having a high curvature.</p> |
