发明名称 METHOD OF MANUFACTURING PLASMA DISPLAY DEVICE, SANDBLAST PROCESSING METHOD, AND PLASMA DISPLAY DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a method of manufacturing a high definition plasma display device which improves the shape precision of partitions for forming the partitions by sandblasting while achieving the easy and secure peeling of resist patterns. SOLUTION: A fine stripe-shaped resist pattern 25 conforming to the partition pitch is formed on a partition material layer 24A. When outside connection terminal portions 22A of address electrodes 22 are coated with a resist pattern 25, a notch 25D, for example a slit, is formed on the space 22D covering portions between the adjacent outside connection terminal portions 22A. By reducing the variations in the density of the resist patterns 25, that is, in the area of each solid pattern in the whole of the resist patterns 25 over the entire region of a back face substrate 21, a deviation in density of the resist patterns 25 can be decreased or eliminated. COPYRIGHT: (C)2004,JPO
申请公布号 JP2003281996(A) 申请公布日期 2003.10.03
申请号 JP20020085126 申请日期 2002.03.26
申请人 SONY CORP 发明人 KAWAGUCHI HIDEHIRO;YOSHIKAWA EITARO
分类号 H01J9/02;H01J11/22;H01J11/24;H01J11/34;H01J11/36;H01J11/38;H01J11/46;(IPC1-7):H01J9/02;H01J11/02 主分类号 H01J9/02
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