| 摘要 |
<P>PROBLEM TO BE SOLVED: To improve the uniformity of a surface to be polished by eliminating selectively convex portions without degrading the quality or significant lowering of throughput. <P>SOLUTION: The polishing machine 1 for polishing the surface 22 to be polished by means of relative friction movement caused by contacts of polishing pads 11 with the surface 22 to be polished of a material (a substrate 21) to be polished, wherein there are provided a plurality of polishing pads 11, each of which is rotatable and defines the peripheral surface 12 thereof as a polishing surface. Thereby, polishing is performed by making the peripheral surface 12 of each polishing pad 11 in contact with a part of the surface 22 to be polished. <P>COPYRIGHT: (C)2004,JPO |
